Issued Patents 2011
Showing 1–3 of 3 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8008136 | Fully silicided gate structure for FinFET devices | Witold P. Maszara, Haihong Wang, Bin Yu | 2011-08-30 |
| 7994020 | Method of forming finned semiconductor devices with trench isolation | Zoran Krivokapic, Witek Maszara | 2011-08-09 |
| 7871873 | Method of forming fin structures using a sacrificial etch stop layer on bulk semiconductor material | Witold P. Maszara, Jin Cho, Zoran Krivokapic | 2011-01-18 |