Issued Patents 2011
Showing 1–3 of 3 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8067252 | Method for determining low-noise power spectral density for characterizing line edge roughness in semiconductor wafer processing | Yuansheng Ma, Thomas I. Wallow | 2011-11-29 |
| 7985513 | Fluorine-passivated reticles for use in lithography and methods for fabricating the same | Uzodinma Okoroanyanwu, Anna Tchikoulaeva, Rene Wirtz | 2011-07-26 |
| 7986146 | Method and system for detecting existence of an undesirable particle during semiconductor fabrication | Obert R. Wood, II | 2011-07-26 |