Issued Patents 2004
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6787284 | Positive resist composition and base material carrying layer of the positive resist composition | Toshiyuki Ogata, Koutaro Endo | 2004-09-07 |
| 6683202 | Fluorine-containing monomeric ester compound for base resin in photoresist composition | Toshiyuki Ogata, Kotaro Endo | 2004-01-27 |