Issued Patents 2004
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6686292 | Plasma etch method for forming uniform linewidth residue free patterned composite silicon containing dielectric layer/silicon stack layer | Sheng-Liang Pan | 2004-02-03 |
| 6682659 | Method for forming corrosion inhibited conductor layer | Ching-Wen Cho, Kuwi-Jen Chang, Sen-Fu Chen, Kuang-Peng Lin, Shing-Jzy Tay +6 more | 2004-01-27 |