Issued Patents 2004
Showing 1–3 of 3 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6811955 | Method for photoresist development with improved CD | Wei-Jen Wu, Sung-Cheng Chiu, Ching-Jiunn Huang | 2004-11-02 |
| 6743735 | Photoresist removal from alignment marks through wafer edge exposure | Po-Tao Chu, Hsin-Yuan Chen, Chung-Jen Chen, Tai-Ming Yang | 2004-06-01 |
| 6727029 | Method for making reticles with reduced particle contamination and reticles formed | Paul K. Chu, Chiou-Sung Chiu, Chih-Wing Chang | 2004-04-27 |