Issued Patents 2004
Showing 1–1 of 1 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6764809 | CO2-processes photoresists, polymers, and photoactive compounds for microlithography | Joseph M. DeSimone, Ruben G. Carbonell, Jonathan Kendall | 2004-07-20 |
Showing 1–1 of 1 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6764809 | CO2-processes photoresists, polymers, and photoactive compounds for microlithography | Joseph M. DeSimone, Ruben G. Carbonell, Jonathan Kendall | 2004-07-20 |