Issued Patents 2004
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6835511 | Methods and apparatus for detecting and correcting reticle deformations in microlithography | — | 2004-12-28 |
| 6750464 | Alignment-mark patterns defined on a stencil reticle and detectable, after lithographic transfer to a substrate, using an optical-based detector | Jin Udagawa | 2004-06-15 |