Issued Patents 2004
Showing 1–7 of 7 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6833109 | Method and apparatus for storing a semiconductor wafer after its CMP polishing | Shinya Yamasaki | 2004-12-21 |
| 6797648 | Cleaning water for cleaning a wafer and method of cleaning a wafer | Hiroaki Tomimori | 2004-09-28 |
| 6787293 | Photoresist residue remover composition | Takuo Oowada, Norio Ishikawa, Kenichi Nakabeppu, Yoshiko Kasama | 2004-09-07 |
| 6787480 | Manufacturing method of semicondcutor device | Hiroaki Tomimori, Norio Okada, Tatsuya Usami, Koichi Ohto, Takamasa Tanikuni | 2004-09-07 |
| 6767409 | Method for cleaning semiconductor wafer after chemical mechanical polishing on copper wiring | Shinya Yamasaki | 2004-07-27 |
| 6695683 | Semiconductor device washing apparatus and a method of washing a semiconductor device | — | 2004-02-24 |
| 6683007 | Etching and cleaning methods and etching and cleaning apparatus used therefor | Shinya Yamasaki | 2004-01-27 |