YK

Yoshika Kimura

RT Renesas Technology: 1 patents #498 of 1,436Top 35%
📍 Kasai, JP: #224 of 642 inventorsTop 35%
Overall (2004): #82,692 of 270,089Top 35%
1
Patents 2004

Issued Patents 2004

Showing 1–1 of 1 patents

Patent #TitleCo-InventorsDate
6815142 Method for forming resist pattern, and overlying layer material and semiconductor device used for forming resist pattern Takeo Ishibashi 2004-11-09