MK

Miho Kurihara

HC Hitachi Chemical Company: 1 patents #20 of 118Top 20%
Overall (2004): #153,134 of 270,089Top 60%
1
Patents 2004

Issued Patents 2004

Showing 1–1 of 1 patents

Patent #TitleCo-InventorsDate
6783434 CMP abrasive, liquid additive for CMP abrasive and method for polishing substrate Toshihiko Akahori, Toranosuke Ashizawa, Keizo Hirai, Masato Yoshida, Yasushi Kurata 2004-08-31