MM

Melvin Montgomery

Applied Materials: 2 patents #121 of 720Top 20%
📍 New Windsor, NY: #1 of 10 inventorsTop 10%
🗺 New York: #1,410 of 9,035 inventorsTop 20%
Overall (2004): #50,244 of 270,089Top 20%
2
Patents 2004

Issued Patents 2004

Showing 1–2 of 2 patents

Patent #TitleCo-InventorsDate
6727047 Method of extending the stability of a photoresist during direct writing of an image upon the photoresist Cecilia Annette Montgomery 2004-04-27
6703169 Method of preparing optically imaged high performance photomasks Scott Edward Fuller, Jeffrey Albelo, Alex Buxbaum 2004-03-09