Issued Patents 2003
Showing 1–12 of 12 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6664147 | Method of forming thin film transistors on predominantly <100> polycrystalline silicon films | — | 2003-12-16 |
| 6660576 | Substrate and method for producing variable quality substrate material | Yasuhiro Mitiani, Mark Albert Crowder | 2003-12-09 |
| 6649032 | System and method for sputtering silicon films using hydrogen gas mixtures | — | 2003-11-18 |
| 6645454 | System and method for regulating lateral growth in laser irradiated silicon films | — | 2003-11-11 |
| 6642092 | Thin-film transistors formed on a metal foil substrate | John W. Hartzell, Masahiro Adachi | 2003-11-04 |
| 6635555 | Method of controlling crystallographic orientation in laser-annealed polycrystalline silicon films | — | 2003-10-21 |
| 6623653 | System and method for etching adjoining layers of silicon and indium tin oxide | Gaku Furuta | 2003-09-23 |
| 6607971 | Method for extending a laser annealing pulse | Masao Moriguchi, Yasuhiro Mitani | 2003-08-19 |
| 6590228 | LCD device with optimized channel characteristics | John W. Hartzell, Yukihiko Nakata | 2003-07-08 |
| 6580053 | Apparatus to control the amount of oxygen incorporated into polycrystalline silicon film during excimer laser processing of silicon films | — | 2003-06-17 |
| 6579425 | System and method for forming base coat and thin film layers by sequential sputter depositing | Yukihiko Nakata | 2003-06-17 |
| 6573163 | Method of optimizing channel characteristics using multiple masks to form laterally crystallized ELA poly-Si films | John W. Hartzell, Yukihiko Nakata | 2003-06-03 |