Issued Patents 2003
Showing 1–7 of 7 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6642336 | Photosensitive polymer | Sook Lee, Ki Young Kwon, Si-hyeung Lee, Kwang-Sub Yoon, Hyun-Woo Kim +2 more | 2003-11-04 |
| 6596459 | Photosensitive polymer and resist composition containing the same | Hyun-Woo Kim, Ki Young Kwon, Si-hyeung Lee, Dong-won Jung, Sook Lee +2 more | 2003-07-22 |
| 6593441 | Photosensitive polymer and chemically amplified photoresist composition containing the same | Dong-won Jung, Si-hyeung Lee, Sook Lee | 2003-07-15 |
| 6537727 | Resist composition comprising photosensitive polymer having loctone in its backbone | Kwang-Sub Yoon, Dong-won Jung, Si-hyeung Lee, Hyun-Woo Kim, Sook Lee +1 more | 2003-03-25 |
| 6517990 | Photosensitive polymer including copolymer of alkyl vinyl ether and resist composition containing the same | Hyun-Woo Kim | 2003-02-11 |
| 6515038 | Resist compositions containing polymers having dialkyl malonate groups for use in chemically amplified resists | — | 2003-02-04 |
| 6503687 | Alicyclic photosensitive polymer, resist composition containing the same and method of preparing the resist composition | Hyun-Woo Kim, Si-hyueng Lee, Ki Young Kwon, Dong-won Jung, Sang-Gyun Woo | 2003-01-07 |