Issued Patents 2003
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6570174 | OPTICAL PROXIMITY EFFECT CORRECTING METHOD IN SEMICONDUCTOR MANUFACTURING PROCESS, WHICH CAN SUFFICIENTLY CORRECT OPTICAL PROXIMITY EFFECT, EVEN UNDER VARIOUS SITUATIONS WITH REGARD TO SIZE AND SHAPE OF DESIGN PATTERN, AND SPACE WIDTH AND POSITION RELATION BETWEEN DESIGN PATTERNS | Takeshi Hamamoto | 2003-05-27 |
| 6519759 | Photomask pattern shape correction method and corrected photomask | — | 2003-02-11 |