Issued Patents 2003
Showing 1–5 of 5 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6638685 | Photoacid generator containing two kinds of sulfonium salt compound, chemically amplified resist containing the same and pattern transfer method | Shigeyuki Iwasa, Kaichiro Nakano, Etsuo Hasegawa | 2003-10-28 |
| 6639084 | Chemically amplified resist, polymer for the chemically amplified resist, monomer for the polymer and method for transferring pattern to chemically amplified resist layer | Kaichiro Nakano | 2003-10-28 |
| 6602647 | Sulfonium salt compound and resist composition and pattern forming method using the same | Shigeyuki Iwasa, Kaichiro Nakano, Etsuo Hasegawa | 2003-08-05 |
| 6559337 | (Meth)acrylate, polymer, photoresist composition, and pattern forming process making use of the composition | Shigeyuki Iwasa, Kaichiro Nakano, Etsuo Hasegawa | 2003-05-06 |
| 6528232 | Sulfonium salt compound, photoresist composition and method for patterning by employing same | Shigeyuki Iwasa, Kaichiro Nakano, Etsuo Hasegawa | 2003-03-04 |