MF

Masashi Fujimoto

NE Nec Electronics: 5 patents #2 of 322Top 1%
NE Nec: 2 patents #90 of 1,409Top 7%
📍 Osaka, JP: #10 of 122 inventorsTop 9%
Overall (2003): #4,014 of 273,478Top 2%
7
Patents 2003

Issued Patents 2003

Showing 1–7 of 7 patents

Patent #TitleCo-InventorsDate
6670632 Reticle and method of fabricating semiconductor device 2003-12-30
6645823 Reticle and method of fabricating semiconductor device 2003-11-11
6613483 Mask for measuring optical aberration and method of measuring optical aberration 2003-09-02
6580492 Reticle system for measurement of effective coherence factors 2003-06-17
6573015 Method of measuring optical aberration 2003-06-03
6522389 Scanning exposure photo-mask and method of scanning exposure and scanning exposure system 2003-02-18
6517982 Mask set for use in phase shift photolithography technique which is suitable to form random patterns, and method of exposure process using the same 2003-02-11