Issued Patents 2003
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6569576 | Reticle cover for preventing ESD damage | Kevin T. Look, Jonathan Ho | 2003-05-27 |
| 6563320 | Mask alignment structure for IC layers | Kevin T. Look | 2003-05-13 |
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6569576 | Reticle cover for preventing ESD damage | Kevin T. Look, Jonathan Ho | 2003-05-27 |
| 6563320 | Mask alignment structure for IC layers | Kevin T. Look | 2003-05-13 |