Issued Patents 2002
Showing 1–1 of 1 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6489227 | Method of etching a polysilicon layer during the stripping of the photoresist shape used as an etch mask to create an opening to an underlying fuse structure | Tsung-Chi Hsieh, Yuan-Ko Hwang, Juei-Wen Lin | 2002-12-03 |