Issued Patents 2002
Showing 1–3 of 3 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6501083 | Methods for calculating cumulative dose of exposure energy from regions of a microlithography reticle for use in correcting proximity effects | — | 2002-12-31 |
| 6489620 | Astigmatism-correction device and charged-particle-beam microlithography apparatus and methods comprising same | — | 2002-12-03 |
| 6432594 | Devices for reducing deflection aberrations in charged-particle-beam optical systems and microlithography apparatus comprising same, and related methods | — | 2002-08-13 |