OO

Osamu Okada

AN Anelva: 1 patents #8 of 56Top 15%
📍 Kyoto, JP: #35 of 63 inventorsTop 60%
Overall (2002): #143,819 of 266,432Top 55%
1
Patents 2002

Issued Patents 2002

Showing 1–1 of 1 patents

Patent #TitleCo-InventorsDate
6387444 Single substrate processing CVD procedure for depositing a metal film using first and second CVD processes in first and second process chambers Atsushi Sekiguchi 2002-05-14