IH

Isao Hagiwara

MC Mitsubishi Gas Chemical Company: 1 patents #32 of 140Top 25%
📍 Namerikawa, JP: #3 of 6 inventorsTop 50%
Overall (2002): #200,928 of 266,432Top 80%
1
Patents 2002

Issued Patents 2002

Showing 1–1 of 1 patents

Patent #TitleCo-InventorsDate
6395452 Photosensitive resin and photosensitive resin composition Kenji Ishii, Toru Harada, Jun Yokoyama 2002-05-28