Issued Patents 2002
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6395449 | Poly-hydroxy aromatic dissolution modifiers for lift-off resists | Daniel J. Nawrocki, Mark J. Shaw | 2002-05-28 |
| 6391523 | Fast drying thick film negative photoresist | Daniel J. Nawrocki, Donald W. Johnson | 2002-05-21 |