Issued Patents 2002
Showing 1–1 of 1 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6486070 | Ultra-high oxide to photoresist selective etch of high-aspect-ratio openings in a low-pressure, high-density plasma | Chok W. Ho, Fang-Ju Lin | 2002-11-26 |
CL
Chuan-Kai Lo
Overall (2002): #241,493 of 266,432Top 95%
1
Patents 2002