Issued Patents 2002
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6441115 | Photosensitive polymer | Shang-Wern Chang, Shang-Ho Lin | 2002-08-27 |
| 6376700 | Alicyclic compound | Shang-Wern Chang, Shang-Ho Lin, Wen-Chieh Wang | 2002-04-23 |
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6441115 | Photosensitive polymer | Shang-Wern Chang, Shang-Ho Lin | 2002-08-27 |
| 6376700 | Alicyclic compound | Shang-Wern Chang, Shang-Ho Lin, Wen-Chieh Wang | 2002-04-23 |