Issued Patents 2002
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6379874 | Using block copolymers as supercritical fluid developable photoresists | Jianguo Wang | 2002-04-30 |
| 6355702 | Acyclic monomers which when cured are reworkable through thermal decomposition | Kenji Ogino | 2002-03-12 |