Issued Patents 2002
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6399208 | Source reagent composition and method for chemical vapor deposition formation or ZR/HF silicate gate dielectric thin films | Thomas H. Baum | 2002-06-04 |
| 6338873 | Method of forming Group II metal-containing films utilizing Group II MOCVD source reagents | Thomas H. Baum | 2002-01-15 |