Issued Patents 1989
Showing 1–3 of 3 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 4873163 | Photomask material | Yaichiro Watakabe, Tatsuo Okamoto | 1989-10-10 |
| 4853341 | Process for forming electrodes for semiconductor devices using focused ion beams | Tadashi Nishioka, Yoji Mashiko, Hiroshi Koyama | 1989-08-01 |
| 4843238 | Method for identifying a blistered film in layered films | Tadashi Nishioka, Yoji Mashiko, Hiroshi Koyama | 1989-06-27 |