Issued Patents 1989
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 4880722 | Diazoquinone sensitized polyamic acid based photoresist compositions having reduced dissolution rates in alkaline developers | Wayne M. Moreau | 1989-11-14 |
| 4810601 | Top imaged resists | Robert David Allen, Ming-Fea Chow, Scott A. MacDonald, Jer-Ming Yang, Carlton G. Willson | 1989-03-07 |