SJ

Sangya Jain

AH American Hoechst: 1 patents #1 of 6Top 20%
HC Hoechst Celanese: 1 patents #51 of 147Top 35%
📍 Fryeburg, ME: #3 of 13 inventorsTop 25%
🗺 Maine: #16 of 153 inventorsTop 15%
Overall (1989): #16,438 of 140,708Top 15%
2
Patents 1989

Issued Patents 1989

Showing 1–2 of 2 patents

Patent #TitleCo-InventorsDate
4863827 Postive working multi-level photoresist Yuh-Loo Chang 1989-09-05
4835086 Polysulfone barrier layer for bi-level photoresists — 1989-05-30