Issued Patents 1989
Showing 1–3 of 3 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 4889795 | Process for forming photoresist pattern using contrast enhancement layer with abietic acid | Katsuaki Kaifu, Maki Kosuge, Yoshio Yamashita, Kenji Kobayashi | 1989-12-26 |
| 4845143 | Pattern-forming material | Toshio Ito, Miwa Sakata, Yoshio Yamashita, Kenji Kobayashi | 1989-07-04 |
| 4801518 | Method of forming a photoresist pattern | Yoshio Yamashita, Ryuji Kawazu, Toshio Itoh, Kenji Kobayashi | 1989-01-31 |