Issued Patents 1989
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 4883686 | Method for the high rate plasma deposition of high quality material | Joachim Doehler, Stanford R. Ovshinsky, Buddie Dotter II, Lester R. Peedin, Jeffrey M. Krisko +1 more | 1989-11-28 |
| 4843443 | Thin film field effect transistor and method of making same | Stanford R. Ovshinsky | 1989-06-27 |