DL

David L. Losee

Eastman Kodak: 1 patents #242 of 729Top 35%
📍 Fairport, NY: #28 of 91 inventorsTop 35%
🗺 New York: #1,258 of 5,342 inventorsTop 25%
Overall (1989): #122,509 of 140,708Top 90%
1
Patents 1989

Issued Patents 1989

Showing 1–1 of 1 patents

Patent #TitleCo-InventorsDate
4888298 Process to eliminate the re-entrant profile in a double polysilicon gate structure Lydia Rivaud, Paul L. Roselle 1989-12-19