RC

Roland L. Chin

PS Petrarch Systems: 1 patents #1 of 6Top 20%
📍 Williamsville, NY: #7 of 39 inventorsTop 20%
🗺 New York: #1,258 of 5,342 inventorsTop 25%
Overall (1989): #64,173 of 140,708Top 50%
1
Patents 1989

Issued Patents 1989

Showing 1–1 of 1 patents

Patent #TitleCo-InventorsDate
4822722 Process of using high contrast photoresist developer with enhanced sensitivity to form positive resist image James M. Lewis, Robert A. Owens, Susan A. Ferguson, Valentine T Zuba 1989-04-18