Issued Patents 1982
Showing 1–4 of 4 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 4356622 | Method of producing low-resistance diffused regions in IC MOS semiconductor circuits in silicon-gate technology metal silicide layer formation | — | 1982-11-02 |
| 4352237 | Method for manufacture of integrated semiconductor circuits, in particular CCD-circuits, with self-adjusting, nonoverlapping polysilicon electrodes | — | 1982-10-05 |
| 4351100 | Method for manufacture of integrated semiconductor circuits, in particular CCD-circuits, with self-adjusting, nonoverlapping polysilicon electrodes | — | 1982-09-28 |
| 4313256 | Method of producing integrated MOS circuits via silicon gate technology | — | 1982-02-02 |